GAF Liquid Diamond
GAF Liquid Diamond
The most common problem occurring in polishing applications is diamond particle agglomerates. In the finest micron sizes, agglomerates are very difficult to disperse. In the finest sumbmicron sizes, the dispersion of agglomerates becomes nearly impossible. For submicron powders, i.e. under 1µm, we recommend the use of GAF Liquid Diamond, which is Guaranteed Agglomerate-Free. It is a concentrate of diamond dispersed in de-ionised water, compatible with all water-soluble carriers. Other solutions exist for applications involving oil-based lubricants, for which please contact us.
SYP GAF, guaranteed agglomerate-free liquid diamond, is supplied in extremely accurate distributions of Syndia® submicron powders. It is used for the preparation of water-soluble polishing media, but also for the manufacture of some special high-precision vitrified diamond wheels used for the finishing of silicon wafers.
SYP GAF Datasheet
SSX GAF, guaranteed agglomerate-free liquid diamond, is supplied in extremely accurate distributions of Supersyndia® submicron powders. It is used for the preparation of water-soluble polishing media.
The SSX GLD variety is suitable for the preparation of oil-soluble media.
SSX GAF Datasheet
CMP-VM125 is a mix of colloidal micron diamond powder in a deionised water base to be used as an additive in the CMP Chemical Mechanical Planarisation process. This polishing process combines mechanical friction and chemical etching to remove all traces of mechanical diamond polishing on components like semi-conductor substrates (wafers), ceramic and sapphire components, sapphire watch crystals, windows and lenses. A 250g bottle of CMP-VM125 is enough to boost the productivity of a 10 litre CMP slurry suspension by up to 50%.
|Median Size (d50)
|SYP GAF||SSX GAF|
Microscopic views of a mix with residual agglomerates and of GAF Liquid Diamond.